共 18 条
[1]
[Anonymous], Nangate open cell library
[2]
Bakshi V., 2008, EUV Lithography
[4]
Smoothing based model for images of isolated buried EUV multilayer defects - art. no. 692119
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2,
2008, 6921
:92119-92119
[5]
Compensation methods for buried defects in extreme ultraviolet lithography masks
[J].
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY,
2010, 7636
[6]
Compensation methods using a new model for buried defects in extreme ultraviolet lithography masks
[J].
PHOTOMASK TECHNOLOGY 2010,
2010, 7823
[7]
Performance of repaired defects and attPSM in EUV multilayer masks
[J].
22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2,
2002, 4889
:418-425
[8]
Development status of EUVL mask blanks in AGC - art. no. 67305D
[J].
PHOTOMASK TECHNOLOGY 2007, PTS 1-3,
2007, 6730
:D7305-D7305
[9]
Hector S., 2004, STANDARDS EUV MASKS
[10]
A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection
[J].
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY,
2010, 7636