Growth of c-axis orientation ZnO films on polymer substrates by radio-frequency magnetron sputtering

被引:15
作者
Chen, Kaixin [1 ]
Chiang, Kin Seng [1 ]
Chan, Hau Ping [1 ]
Chu, Pak Lim [2 ]
机构
[1] City Univ Hong Kong, Dept Elect Engn, Hong Kong, Peoples R China
[2] Cotco Holding Ltd, Hong Kong, Peoples R China
关键词
zinc oxide; thin films; sputtering; polymer substrate; optical waveguide;
D O I
10.1016/j.optmat.2007.06.003
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO films with c-axis orientation were deposited successfully on benzocyclobutene (BCB) and highly fluorinated polyether (HFP) substrates by radio-frequency magnetron sputtering. The effects of the sputtering parameters (argon-oxygen gas flow ratio, sputtering power, and sputtering pressure) on the crystalline quality of the ZnO films were investigated by X-ray diffractometry, atomic force microscopy, and scanning electron microscopy. By using optimized sputtering conditions, uniform ZnO films with good c-axis orientation were formed on hard BCB substrates to a thickness as large as 3.0 mu m. The ZnO films formed on soft HFP substrates, however, were always thinner than 1 mu m. In addition, a ZnO/BCB channel optical waveguide was fabricated, which had a propagation loss of 7.3 dB/cm at the wavelength 1550 nm. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1244 / 1250
页数:7
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