Critical Temperature Enhancement by Biaxial Compressive Strain in FeSe0.5Te0.5 Thin Films

被引:21
作者
Bellingeri, E. [1 ]
Pallecchi, I. [1 ]
Buzio, R. [1 ]
Gerbi, A. [1 ]
Marre, D. [1 ,2 ]
Cimberle, M. R. [2 ]
Tropeano, M. [1 ,2 ]
Putti, M. [1 ,2 ]
Palenzona, A. [1 ,3 ]
Kaciulis, S. [4 ]
Ferdeghini, C. [1 ]
机构
[1] CNR SPIN, I-16152 Genoa, Italy
[2] CNR IMEM, Dipartimento Fis, I-16146 Genoa, Italy
[3] Dipartimento Chim & Chim Ind, I-16146 Genoa, Italy
[4] CNR ISMN, I-00015 Monterotondo Staz, RM, Italy
关键词
Fe(Se; Te); Thin films; Epitaxial growth; Strain;
D O I
10.1007/s10948-010-0896-4
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-purity epitaxial FeSe0.5Te (0.5) thin films with different thicknesses were grown by pulsed laser ablation on different substrates. By varying the film thickness, T (c) values of up to 21 K were observed, significantly larger than the bulk value. Structural analyses indicated that the a axis changes significantly with the film thickness and is linearly related to T (c). The latter result indicates the important role of the compressive strain in enhancing T (c): the compressive strain derives from the Volmer-Weber growth of the films. The critical temperature is also related to both the Fe-(Se,Te) bond length and angle, suggesting the possibility of further enhancement.
引用
收藏
页码:35 / 41
页数:7
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