Dynamics of laser-produced Sn microplasma for a high-brightness extreme ultraviolet light source

被引:29
作者
Yuspeh, S. [1 ]
Tao, Y.
Burdt, R. A.
Tillack, M. S.
Ueno, Y.
Najmabadi, F.
机构
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
关键词
EUV; PLASMA;
D O I
10.1063/1.3589359
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of laser focal spot diameters of 26 and 150 mu m on 13.5 nm extreme ultraviolet (EUV) radiation is investigated. Simulations show that the smaller spot size has a shorter electron plasma density scale length and deeper and denser laser energy deposition region. This results in additional time required for plasma expansion and radiation transport to efficiently emit EUV light. This is experimentally observed as an increase in the delay between the EUV emission and the laser pulse. The shorter scale length plasma reabsorbs less EUV light, resulting in a higher conversion efficiency, smaller and slightly brighter light source. (C) 2011 American Institute of Physics. [doi:10.1063/1.3589359]
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页数:3
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