共 20 条
- [1] Improved reflectance and stability of Mo-Si multilayers [J]. OPTICAL ENGINEERING, 2002, 41 (08) : 1797 - 1804
- [2] Plasma sources for EUV lithography exposure tools [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (23) : 3207 - 3212
- [3] Bayer A., 2010, XRAY OPT INSTRUM
- [4] BRANDT DC, 2009, P SPIE, V7271
- [5] Fomenkov I., 2007, P SPIE, V6517, p65173J
- [7] GOLDBERG K, 2008, 2008 INT WORKSH EUV