A forevacuum plasma source of pulsed electron beams

被引：15

作者：

Yushkov, Yu G. ^{[1
]}

Burdovitsin, V. A. ^{[1
]}

Medovnik, A. V. ^{[1
]}

Oks, E. M. ^{[1
]}

机构：

[1] Tomsk State Univ Control Syst & Elect, Tomsk 634050, Russia

来源：

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2011年 / 54卷 / 02期

基金：

俄罗斯基础研究基金会;

关键词：

LOW-ENERGY; SURFACE-TREATMENT; CATHODE; GENERATION;

D O I：

10.1134/S0020441211010283

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A plasma electron source designed for generation of a pulsed wide-aperture electron beam in the forevacuum pressure range (5-20 Pa) is described. The source is based on the use of a hollow-cathode glow discharge. At an accelerating voltage of 20 kV, a current pulse length of 100 mu s, and a pulse repetition rate of 10 Hz, the electron beam current is 100 A, and the maximum density of the beam pulse power is 10 J/cm(2). The obtained parameters of the electron beam and the features of the source functioning in the forevacuum pressure range show that this source can be used to good effect to modify the surface properties of nonconducting materials.

引用

页码：226 / 229

页数：4

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