Effect of small admixtures of N2, H2 or O2 on the electron drift velocity in argon: experimental measurements and calculations

被引:8
|
作者
Stano, M. [1 ]
Pinhao, N. [2 ]
Loffhagen, D. [3 ]
Kucera, M. [1 ]
Donko, Z. [4 ]
Matejcik, S. [1 ]
机构
[1] Comenius Univ, Bratislava 84248, Slovakia
[2] Nucl & Technol Inst, P-2686953 Sacavem, Portugal
[3] Leibniz Inst Plasma Sci & Technol, D-17489 Greifswald, Germany
[4] Res Inst Solid State Phys & Opt, H-1525 Budapest, Hungary
关键词
NEGATIVE DIFFERENTIAL CONDUCTIVITY; OPTICAL-EMISSION-SPECTROMETRY; LOW-ENERGY ELECTRONS; PRESSURE GLOW-DISCHARGES; ATMOSPHERIC-PRESSURE; BOLTZMANN-EQUATION; DIELECTRIC BARRIER; NITROGEN MIXTURE; SWARM PARAMETERS; CROSS-SECTIONS;
D O I
10.1140/epjd/e2011-20296-7
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The electron drift velocity in argon with admixtures of up to 2% of nitrogen, hydrogen or oxygen is measured in a pulsed Townsend system for reduced electric fields ranging from 0.1 Td to 2.5 Td. The results are compared with those obtained by Monte Carlo simulations and from the solution of the electron Boltzmann equation using two different solution techniques: a multiterm method based on Legendre polynomial expansion of the angular dependence of the velocity distribution function and the S (n) method applied to a density gradient expansion representation of the distribution function. An almost perfect agreement between the results of the three numerical methods and, in general, very good agreement between the experimental and the calculated results is obtained. Measurements in Ar-O-2 mixtures were limited by electron attachment to oxygen molecules, which contributes to the measured drift velocity. As a result of this attachment contribution, the bulk drift velocity becomes larger than the flux drift velocity if attachment is more probable for electrons with energy below the mean value and smaller in the opposite case. Attachment also contributes to the negative differential conductivity observed in Ar-O-2 mixtures.
引用
收藏
页码:489 / 498
页数:10
相关论文
共 50 条
  • [31] Experimentally derived rate coefficients for electron ionization, attachment and detachment as well as ion conversion in pure O2 and N2-O2 mixtures
    Haefliger, P.
    Hosl, A.
    Franck, C. M.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2018, 51 (35)
  • [32] Exploring the mechanisms leading to diffuse and filamentary modes in dielectric barrier discharges in N2 with N2O admixtures
    Hoeft, Hans
    Becker, Markus M.
    Kettlitz, Manfred
    Dap, Simon
    Naude, Nicolas
    Brandenburg, Ronny
    Weltmann, Klaus-Dieter
    EUROPEAN PHYSICAL JOURNAL D, 2023, 77 (03)
  • [33] Effect of oxygen on the conversion of acetaldehyde in homogeneous plasmas of N2/O2/CH3CHO mixtures
    Faider, W.
    Pasquiers, S.
    Blin-Simiand, N.
    Magne, L.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2013, 22 (06)
  • [34] Modes of Generation of Runaway Electron Beams in He, H2, Ne, and N2 at a Pressure of 1-760 Torr
    Tarasenko, Victor F.
    Baksht, Evgenii Kh
    Burachenko, Alexander G.
    Lomaev, Mikhail I.
    Sorokin, Dmitri A.
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2010, 38 (10) : 2583 - 2587
  • [35] The influence of O2 content on the spatio-temporal development of pulsed driven dielectric barrier discharges in O2/N2 gas mixtures
    Hoeft, H.
    Kettlitz, M.
    Hoder, T.
    Weltmann, K-D
    Brandenburg, R.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (09)
  • [36] Single electron capture measurements in collisions of K+ on N2
    Alarcon, F. B.
    Fuentes, B. E.
    Martinez, H.
    Yousif, F. B.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2014, 332 : 317 - 320
  • [37] Time dependent selfconsistent electron energy distribution functions during nanosecond repetitive discharges in reacting N2/H2 mixtures
    Colonna, G.
    Laricchiuta, A.
    Pietanza, L. D.
    PLASMA PHYSICS AND CONTROLLED FUSION, 2020, 62 (01)
  • [38] Collisional line broadening and mixing in the Raman spectrum of CO perturbed by N2 : Experimental measurements and theoretical calculations
    Paredes-Roibas, Denis
    Martinez, Raul Z.
    Jozwiak, Hubert
    Thibault, Frank
    JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 2021, 275
  • [39] Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes
    Volynets, Vladimir
    Barsukov, Yuri
    Kim, Gonjun
    Jung, Ji-Eun
    Nam, Sang Ki
    Han, Kyuhee
    Huang, Shuo
    Kushner, Mark J.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (02):
  • [40] Soft X-ray and Low Energy Electron-Induced Damage to DNA under N2 and O2 Atmospheres
    Alizadeh, Elahe
    Cloutier, Pierre
    Hunting, Darel
    Sanche, Leon
    JOURNAL OF PHYSICAL CHEMISTRY B, 2011, 115 (15) : 4523 - 4531