Wafer-Level Micro-Optics: Trends in Manufacturing, Testing and Packaging

被引：2

作者：

Voelkel, Reinhard ^{[1
]}

Weible, Kenneth J. ^{[1
]}

Eisner, Martin ^{[1
]}

机构：

[1] SUSS MicroOpt SA, CH-2000 Neuchatel, Switzerland

来源：

OPTICAL FABRICATION, TESTING, AND METROLOGY IV | 2011年 / 8169卷

关键词：

Micro-optics; microlens array; diffractive optical elements; wafer-level optics; wafer-level packaging; beam shaping; fiber coupling; array illumination; Shack-Hartmann; confocal microscope; slow-axis collimator; INTERFEROMETER; FABRICATION;

D O I：

10.1117/12.897114

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Micro-optics is an indispensable key enabling technology (KET) for many applications today. The important role of micro-optical components is based on three different motivations: miniaturization, high functionality and packaging aspects. It is obvious that miniaturized systems require micro-optics for light focusing, light shaping and imaging. More important for industrial applications is the high functionality of micro-optics that allows combining these different functions in one element. In DUV Lithography Steppers and Scanners an extremely precise beam shaping of the Excimer laser profile is required. High-precision diffractive optical elements are well suited for this task. For Wafer-Level Cameras (WLC) and fiber optical systems the packaging aspects are more important. Wafer-Level Micro-Optics technology allows manufacturing and packaging some thousands of sub-components in parallel. We report on the state of the art in wafer-based manufacturing, testing and packaging.

引用

页数：12

共 25 条

[1]

[Anonymous], 2002, EUIST200135366

[2]

Arnulf A., 1932, US Patent, Patent No. [2,018,592, 2018592]

[3] COMPLEX SPATIAL FILTERING WITH BINARY MASKS [J].

BROWN, BR ;

LOHMANN, AW .

APPLIED OPTICS, 1966, 5 (06) :967-&

[4]

Dresel T., 1992, Pure and Applied Optics, V1, P241, DOI 10.1088/0963-9659/1/5/001

[5]

Duparre Jacques, 2004, Deutsche Patentanmeldung, Patent No. [10 2001 003 013.8, 1020010030138]

[6] A NEW MICROSCOPIC PRINCIPLE [J].

GABOR, D .

NATURE, 1948, 161 (4098) :777-778

[7]

Gale M. T., 1977, US Patent, Patent No. 4155627

[8]

Hanak J. J., 1971, US Patent, Patent No. 3733258

[9] Half-tone proximity lithography [J].

Harzendorf, Torsten ;

Stuerzebecher, Lorenz ;

Vogler, Uwe ;

Zeitner, Uwe D. ;

Voelkel, Reinhard .

MICRO-OPTICS 2010, 2010, 7716

[10]

Hess W. R., 1912, US Patent, Patent No. 1128979

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