Control of the concentration of protons intercalated into tungsten oxide thin films during deposition

被引:9
作者
Yamada, Y. [1 ]
Tajima, K. [1 ]
Okada, M. [1 ]
Bao, S. [1 ]
Tazawa, M. [1 ]
Yoshimura, K. [1 ]
Roos, A. [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Moriyama Ku, 2266-98 Anagahora, Nagoya, Aichi 4638560, Japan
[2] Uppsala Univ, Angstrom Lab, S-75121 Uppsala, Sweden
来源
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 5 | 2008年 / 5卷 / 05期
关键词
D O I
10.1002/pssc.200777734
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Tungsten oxide thin films with protons intercalated during deposition (HxWO3) were prepared using reactive direct-current magnetron sputtering in a gas mixture of argon, oxygen, and hydrogen. The as-deposited films were tungsten bronze. The concentration of intercalated protons, given by the x-values in HxWO3, was evaluated by electrochemically ejecting protons from the films. The x-value was proportional to the hydrogen flow ratio at the deposition. The dispersion of the extinction coefficient (kappa) of the films was estimated by analyzing the experimental spectra measured with spectroscopic ellipsometry using the model composed of a homogeneous tungsten bronze layer with an additional surface roughness layer. As a result of this analysis, and a linear dependence existed between the x-value of the HxWO3 films using this dependence without ejecting protons.
引用
收藏
页码:1105 / +
页数:2
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