X-ray absorption near-edge structure and optical properties of hafnium oxynitride thin films

被引：1
|
作者：
Kim, Sung Kwan [2 ]
Kim, Yang-soo [1 ]
No, Kwang-soo [2 ]
机构：
[1] Korea Basic Sci Inst, Sunchon Branch, Sunchon 540742, Jeonnam, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
来源：
ADVANCES IN QUANTUM CHEMISTRY, VOL 54: DV-X ALPHA FOR INDUSTRIAL-ACADEMIC COOPERATION | 2008年 / 54卷
关键词：
D O I：
10.1016/S0065-3276(07)00007-X
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Using the suggested local structures of HfO2 (coordination number: 7.0), Hf4O5N2 (6.25), and Hf4O2N4 (5.5) in the previous research, we analyzed the effects of film composition on the X-ray absorption near-edge structure (XANES) spectra for O K-edge and N K-edge of hafnium oxynitride (Hf-O-N) thin films. The dispersion of optical constants for Hf-O-N thin films was analyzed using a four-phase model of ambient/graded/film/substrate for spectroscopy ellipsometry analysis. Two Cody-Lorentz models were applied for the spectroscopy ellipsometry analysis of films based on the XANES spectra. The effects of film composition on the dispersion of optical constants and on the surface degradation were analyzed.
引用
收藏
页码：81 / 88
页数：8
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