Kinetics of the boron-oxygen related defect in theory and experiment

被引:104
作者
Herguth, Axel [1 ]
Hahn, Giso [1 ]
机构
[1] Univ Konstanz, Dept Phys, D-78464 Constance, Germany
关键词
CRYSTALLINE SILICON; DEGRADATION;
D O I
10.1063/1.3517155
中图分类号
O59 [应用物理学];
学科分类号
摘要
The formation of boron-oxygen complexes in boron-doped crystalline silicon can lead to a severe reduction in the minority charge carrier lifetime. This strongly influences, e.g., solar cell efficiencies if the material is used for photovoltaic application. Recent investigations have shown that a recovery of the carrier lifetime can be achieved by a subsequent thermally enhanced reaction induced by charge carriers. A model of the reaction dynamics of the boron-oxygen complex by means of rate equations is presented in this paper. Following a mathematical description of the reactions involved, the consequences based on the calculations are presented and allow a prediction of the observable electrical parameters. The fundamental agreement with measured data is proven experimentally for different phenomena. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3517155]
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页数:7
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