Fabrication of free-standing subwavelength metal-insulator-metal gratings using high-aspect-ratio nanoimprint techniques

被引：3

作者：

Honma, Hiroaki ^{[1
,2
]}

Mitsudome, Masato ^{[1
]}

Itoh, Shintaro ^{[3
]}

Ishida, Makoto ^{[1
,4
]}

Sawada, Kazuaki ^{[1
,4
]}

Takahashi, Kazuhiro ^{[1
]}

机构：

[1] Toyohashi Univ Technol, Dept Elect & Elect Informat Engn, Toyohashi, Aichi 4418580, Japan

[2] Japan Soc Promot Sci, Chiyoda Ku, Tokyo 1020083, Japan

[3] Nagoya Univ, Dept Micronano Syst Engn, Nagoya, Aichi 4648603, Japan

[4] Toyohashi Univ Technol, Elect Inspired Interdisciplinary Res Inst EIIRIS, Toyohashi, Aichi 4418580, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2016年 / 55卷 / 06期

关键词：

PLASMONIC COLOR FILTERS; IMAGE SENSOR; LITHOGRAPHY; LAYER;

D O I：

10.7567/JJAP.55.06GP20

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this paper, we report on the construction of a free-standing metal-insulator-metal (MIM) subwavelength grating by nanoimprint and lift-off techniques, which can be used as a plasmonic color filter for imaging a multicolor spectrum. The free-standing subwavelength grating was designed to be composed of Al (50 nm)-SiO2 (150 nm)-Al (50 nm) layers, and the thickness of the SiO2 layer determined the wavelength selectivity for the color filter. The residual-free nanoimprint with an aspect ratio of 6 : 1 was applied in the lift-off process to the formation of MIM gratings. We successfully developed subwavelength MIM gratings with heights of more than 200 nm. We also demonstrated the fabrication of a free-standing MIM grating without lateral stiction, which was expected to improve the wavelength selectivity of a free-standing plasmonic color filter. (C) 2016 The Japan Society of Applied Physics

引用

页数：5

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