Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates

被引：7

作者：

Bae, Changdeuck ^{[2
]}

Kim, Hyunchul ^{[1
]}

Shin, Hyunjung ^{[1
]}

机构：

[1] Kookmin Univ, Sch Adv Mat Engn, Seoul 136702, South Korea

[2] Univ Hamburg, Inst Appl Phys, D-20355 Hamburg, Germany

来源：

CHEMICAL COMMUNICATIONS | 2011年 / 47卷 / 18期

关键词：

FABRICATION; GOLD;

D O I：

10.1039/c1cc10283d

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO2/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs.

引用

收藏

页码：5145 / 5147

页数：3

相关论文

共 27 条

[1] Contact area lithography (CAL): A new approach to direct formation of nanometric chemical patterns [J].

Bae, C ;

Shin, HJ ;

Moon, J ;

Sung, MM .

CHEMISTRY OF MATERIALS, 2006, 18 (05) :1085-1088

[2] Fabrication of monodisperse asymmetric colloidal clusters by using contact area lithography (CAL) [J].

Bae, Changdeuck ;

Moon, Jooho ;

Shin, Hyunjung ;

Kim, Jiyoung ;

Sung, Myung M. .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2007, 129 (46) :14232-14239

[3] Decal transfer microlithography: A new soft-lithographic patterning method [J].

Childs, WR ;

Nuzzo, RG .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2002, 124 (45) :13583-13596

[4] Nanoimprint lithography [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4129-4133

[5] Direct patterning of modified oligonucleotides on metals and insulators by dip-pen nanolithography [J].

Demers, LM ;

Ginger, DS ;

Park, SJ ;

Li, Z ;

Chung, SW ;

Mirkin, CA .

SCIENCE, 2002, 296 (5574) :1836-1838

[6] Formation and patterning of self-assembled monolayers derived from long-chain organosilicon amphiphiles and their use as templates in materials microfabrication [J].

Finnie, KR ;

Haasch, R ;

Nuzzo, RG .

LANGMUIR, 2000, 16 (17) :6968-6976

[7] New approaches to nanofabrication: Molding, printing, and other techniques [J].

Gates, BD ;

Xu, QB ;

Stewart, M ;

Ryan, D ;

Willson, CG ;

Whitesides, GM .

CHEMICAL REVIEWS, 2005, 105 (04) :1171-1196

[8] NANOSPHERE LITHOGRAPHY - A MATERIALS GENERAL FABRICATION PROCESS FOR PERIODIC PARTICLE ARRAY SURFACES [J].

HULTEEN, JC ;

VANDUYNE, RP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1553-1558

[9] Self-assembled-monolayer film islands as a self-patterned-mask for SiO2 thickness measurement with atomic force microscopy [J].

Komeda, T ;

Namba, K ;

Nishioka, Y .

APPLIED PHYSICS LETTERS, 1997, 70 (25) :3398-3400

[10] Scanning probe lithography using self-assembled monolayers [J].

Krämer, S ;

Fuierer, RR ;

Gorman, CB .

CHEMICAL REVIEWS, 2003, 103 (11) :4367-4418