Prediction of the circumferential film thickness distribution in horizontal annular gas-liquid flow

被引:21
作者
Hurlburt, ET
Newell, TA
机构
[1] Univ Illinois, Dept Chem Engn, Roger Adams Lab 291, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Mech & Ind Engn, Urbana, IL 61801 USA
来源
JOURNAL OF FLUIDS ENGINEERING-TRANSACTIONS OF THE ASME | 2000年 / 122卷 / 02期
关键词
two-phase flow; annular flow; horizontal gas-liquid flow; liquid film thickness distribution;
D O I
10.1115/1.483269
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
This paper develops a liquid film symmetric correlation and a liquid film thickness distribution model for horizontal annular gas-liquid pipe flows, The symmetry correlation builds on the work of Williams et al. (1996) (Droplet Flux Distributions and Entrainment in Horizontal Gas-Liquid Flows," Int. J. Multiphase Flow, Vol. 22, pp. 1-18). A new correlating parameter is presented The liquid film thickness model is based on the work of Laurinat et al. (1985) (Film Thickness Distribution for Gas-Liquid Annular Flow in a Horizontal Pipe." PhysicoChem. Hydrodynam., Vol. 6, pp. 179-195). The circumferential momentum equation is simplified to a balance between the normal Reynolds stress in the film's circumferential direction and the circumferential component of the weight of the film. A model for the normal Reynolds stress in the circumferential direction is proposed. The symmetry correlation is used to close the model equations. The model is valid for films with disturbance waves, and is shown to be applicable to air-water flows over a range of conditions from low velocity asymmetric to high velocity symmetric annular flows. [S0098-2202(00)02102-7].
引用
收藏
页码:396 / 402
页数:7
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