Combined high-resolution XPS and EXAFS study of Ag photodissolution in a-As2S3 thin film

被引：12

作者：

Kovalskiy, Andriy ^{[1
]}

Ganjoo, Ashtosh ^{[1
]}

Khalid, Syed ^{[2
]}

Jain, Himanshu ^{[1
]}

机构：

[1] Lehigh Univ, Dept Mat Sci & Engn, Bethlehem, PA 18015 USA

[2] Brookhaven Natl Lab, Upton, NY 11973 USA

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2010年 / 356卷 / 44-49期

关键词：

Chalcogenide glass; Thin films; EXAFS; X-ray photoelectron spectroscopy; Silver; Photodissolution; CHALCOGENIDE FILMS; AMORPHOUS FILMS; LOCAL-STRUCTURE; GLASSES; ANION; RB;

D O I：

10.1016/j.jnoncrysol.2010.02.021

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Changes of electronic and atomic structure during silver photodissolution in As2S3 thin film are studied using a combination of high-resolution X-ray photoelectron spectroscopy (XPS) and extended X-ray absorption fine structure (EXAFS) methods. It is shown that the photodiffusion process starts already under the influence of Al K-alpha and synchrotron X-ray probe radiations, forming a highly disordered metastable structure. Concurrent irradiation with UVNIS light leads to the formation of a stable uniform ternary phase. The mechanisms of structural transformations and final chemical products are proposed. The influence of surface oxidation on the structure of Ag/As2S3 bilayer is also investigated. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2332 / 2336

页数：5

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