Probing electrical properties of a silicon nanocrystal thin film using x-ray photoelectron spectroscopy

被引:1
|
作者
Laudari, Amrit [1 ]
Pathiranage, Sameera [1 ]
Thomas, Salim A. [2 ]
Petersen, Reed J. [3 ]
Anderson, Kenneth J. [2 ]
Pringle, Todd A. [2 ]
Hobbie, Erik K. [2 ]
Oncel, Nuri [1 ]
机构
[1] Univ North Dakota, Dept Phys & Astrophys, Grand Forks, ND 58202 USA
[2] North Dakota State Univ, Mat & Nanotechnol Program, Fargo, ND 58202 USA
[3] North Dakota State Univ, Dept Phys, Fargo, ND USA
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2022年 / 93卷 / 08期
关键词
DIELECTRIC-CONSTANT; PHOTOLUMINESCENCE; SIZE;
D O I
10.1063/5.0090166
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We performed x-ray photoelectron spectroscopy measurements on a thin film of Si nanocrystals (SiNCs) while applying DC or AC external biases to extract the resistance and the capacitance of the thin film. The measurement consists of the application of 10 V DC or square wave pulses of 10 V amplitude to the sample at various frequencies ranging from 0.01 to 1 MHz while recording x-ray photoemission data. To analyze the data, we propose three different models with varying degrees of accuracy. The calculated capacitance of SiNCs agrees with the experimental value in the literature. Published under an exclusive license by AIP Publishing.
引用
收藏
页数:6
相关论文
共 50 条
  • [1] A systematic study to investigate the effects of x-ray exposure on electrical properties of silicon dioxide thin films using x-ray photoelectron spectroscopy
    Munoz, Carlos
    Iken, Thomas
    Oncel, Nuri
    JOURNAL OF CHEMICAL PHYSICS, 2023, 159 (16):
  • [2] Probing the Roughness of Porphyrin Thin Films with X-ray Photoelectron Spectroscopy
    Kataev, Elmar
    Wechsler, Daniel
    Williams, Federico J.
    Koebl, Julia
    Tsud, Natalia
    Franchi, Stefano
    Steinrueck, Hans-Peter
    Lytken, Ole
    CHEMPHYSCHEM, 2020, 21 (20) : 2293 - 2300
  • [3] Probing molecular orientations in thin films by x-ray photoelectron spectroscopy
    Li, Y.
    Li, P.
    Lu, Z. -H.
    AIP ADVANCES, 2018, 8 (03):
  • [4] X-ray photoelectron spectroscopy of zinc phosphide thin film
    Nayak, A
    Banerjee, HD
    APPLIED SURFACE SCIENCE, 1999, 148 (3-4) : 205 - 210
  • [5] Evaluating superconducting YBCO film properties using X-ray photoelectron spectroscopy
    Barnes, PN
    Tolliver, JC
    Haugan, TJ
    Mukhopadhyay, SM
    Grant, JT
    FABRICATION OF LONG-LENGTH AND BULK HIGH TERMPERATURE SUPERCONDUCTORS, 2004, 149 : 23 - 31
  • [6] Measurement of silicon dioxide film thicknesses by x-ray photoelectron spectroscopy
    Powell, CJ
    Jablonski, A
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000, INTERNATIONAL CONFERENCE, 2001, 550 : 591 - 595
  • [7] Characterization of silicon oxynitride thin films by x-ray photoelectron spectroscopy
    Shallenberger, JR
    Cole, DA
    Novak, SW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04): : 1086 - 1090
  • [8] In situ x-ray photoelectron spectroscopy for thin film synthesis monitoring
    Kelly, MA
    Shek, ML
    Pianetta, P
    Gür, TM
    Beasley, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05): : 2127 - 2133
  • [9] Probing deeper by hard x-ray photoelectron spectroscopy
    Risterucci, P.
    Renault, O.
    Martinez, E.
    Detlefs, B.
    Delaye, V.
    Zegenhagen, J.
    Gaumer, C.
    Grenet, G.
    Tougaard, S.
    APPLIED PHYSICS LETTERS, 2014, 104 (05)
  • [10] X-ray photoelectron spectroscopy of thin films
    Nature Reviews Methods Primers, 3 (1):