Effect of hydrogen on the growth of single-walled carbon nanotubes by thermal chemical vapor deposition

被引:25
作者
Rao, Fu-Bo [1 ,2 ]
Li, Tie [1 ]
Wang, Yue-Lin [1 ]
机构
[1] Shanghai Inst Microsyst & Informat Technol, Natl Key Lab Microsyst Technol, State Key Lab Transducer Technol, Shanghai 200050, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
关键词
single-walled carbon nanotubes; chemical vapor deposition; hydrogen etching; ratio;
D O I
10.1016/j.physe.2007.09.185
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Single-walled carbon nanotubes (SWCNTs) were synthesized on SiO2/Si substrates and patterned SiO2 platforms by thermal chemical vapor deposition (CVD) using methane as carbon source. The effect of hydrogen on the growth of SWCNTs was systematically investigated with different combinations of methane and hydrogen at growth temperatures 800 and 900 degrees C. The results show that when iron oxide nanoparticles were used as catalysts, hydrogen was required for the formation of SWCNTs at 800 degrees C, but it was not necessary for the formation of SWCNTs at 900 degrees C. The yield of SWCNTs was found to be remarkably sensitive to the hydrogen concentration in the growth environment at 900 degrees C, but it shows less sensitivity to hydrogen concentration at 800 degrees C. The highest yield of SWCNTs was achieved under the condition H-2/CH4 = 1000/1000 Standard cubic centimeter per minute (sccm) at 900 degrees C. In addition, the etching effect of hydrogen on SWCNTs in thermal CVD was also investigated at 800 and 900 degrees C. Results show SWCNTs can be etched by hydrogen at 900 degrees C but retains after the hydrogen treatment at 800 degrees C. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:779 / 784
页数:6
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