Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography

被引:14
|
作者
Tanabe, Akira [1 ]
Uehara, Takuya [1 ]
Nagase, Kazuro [2 ]
Ikedo, Hiroaki [2 ]
Hiroshiba, Nobuya [1 ]
Nakamura, Takahiro [1 ]
Nakagawa, Masaru [1 ]
机构
[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat IMRAM, Sendai, Miyagi 9808577, Japan
[2] Mino Grp Co Ltd, Gifu 5014101, Japan
关键词
FLASH IMPRINT LITHOGRAPHY; MOLD; FABRICATION; RESOLUTION; DEFECTS; STEP;
D O I
10.7567/JJAP.55.06GM01
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrated a coating method of screen printing for discharging droplets of a high-viscosity resin on a substrate for ultraviolet (UV) nanoimprint lithography (NIL). Compared with a spin-coated resin film on a silicon substrate, discharged resin droplets on a silicon substrate were effective in terms of the uniformity of residual layer thickness (RLT) in contact with a mold with various pattern densities. Fluorescence microscope observations with a fluorescent-dye-containing UV-curable resin enabled the evaluation of the shapes of resin droplets discharged on a substrate surface. Widely used screen mesh plates composed of a stainless mesh covered with a patterned emulsion film caused defects of undischarged parts, whereas defects-free resin droplets with a narrow size distribution were discharged by mesh-free plates prepared with laser ablation. The pitch-to-diameter ratio in the configuration of 10-mu m-diameter holes needs to be larger than 2.5 times for printing a resin having a viscosity of 12,800mPas. (C) 2016 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [1] Fluorescent UV-Curable Resists for UV Nanoimprint Lithography
    Kobayashi, Kei
    Sakai, Nobuji
    Matsui, Shinji
    Nakagawa, Masaru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 06GL071 - 06GL076
  • [2] Nanoimprint Lithography with UV-Curable Hyperbranched Polymer Nanocomposites
    Geiser, Valerie
    Jin, Young-Hyun
    Leterrier, Yves
    Manson, Jan-Anders E.
    MODERN TRENDS IN POLYMER SCIENCE-EPF 09, 2010, 296 : 144 - 153
  • [3] Effects of Environmental Gas in UV Nanoimprint on the Characteristics of UV-Curable Resin
    Wang, Qing
    Hiroshima, Hiroshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 06GL041 - 06GL044
  • [4] UV-curable resins appropriate for UV nanoimprint
    Iyoshi, Shuso
    Miyake, Hiroto
    Nakamatsu, Ken-ichiro
    Matsui, Shinji
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2008, 21 (04) : 573 - 581
  • [5] UV-curable positive photoresists for screen printing plate
    Shirai, Masamitsu
    Okamura, Haruyuki
    POLYMER INTERNATIONAL, 2016, 65 (04) : 362 - 370
  • [6] Development of UV curable resin for UV nanoimprint
    Osaki T.
    Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering, 2020, 86 (04): : 259 - 262
  • [7] Polymerization shrinkage stress measurement for a UV-curable resist in nanoimprint lithography
    Amirsadeghi, Alborz
    Lee, Jae Jong
    Park, Sunggook
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2011, 21 (11)
  • [8] Pattern distortion in nanoimprint lithography using UV-curable polymer stamps
    Li, Fangfang
    Fetisova, Marina
    Koskinen, Mervi
    Viheriala, Jukka
    Niemi, Tapio
    Karvinen, Petri
    Kuittinen, Markku
    MICRO AND NANO ENGINEERING, 2024, 25
  • [9] UV-curable nanoimprint resin with enhanced anti-sticking property
    Kim, Joo Yeon
    Choi, Dae-Geun
    Jeong, Jun-Ho
    Lee, Eung-Sug
    APPLIED SURFACE SCIENCE, 2008, 254 (15) : 4793 - 4796
  • [10] Research on the Performance of UV-Curable Screen Printing Watermark Varnish
    Huang, Beiqing
    Wang, Si
    Yuan, Wei
    Wei, Xianfu
    PROCEEDINGS OF THE 17TH IAPRI WORLD CONFERENCE ON PACKAGING, 2010, : 311 - +