Giant magnetoresistance in electrodeposited Ni-Cu/Cu multilayers and anisotropic magnetoresistance in pulse-plated NixCu1-x alloy films

被引:16
作者
Kazeminezhad, I [1 ]
Schwarzacher, W
机构
[1] Shahid Charman Univ, Dept Phys, Ahvaz, Iran
[2] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
关键词
alloys; anisotropic magnetoresistance; electrodeposition; giant magnetoresistance; multilayers;
D O I
10.1007/s10008-003-0422-8
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Ni-Cu/Cu multilayers and NixCu1-x alloy films were electrodeposited on Au-coated glass substrates from a sulfamate-based electrolyte. The room-temperature magnetoresistance of the multilayers was studied as a function of the ferromagnetic Ni-Cu layer thickness. Giant magnetoresistance was observed, which peaked at about 1% for a Ni-Cu layer thickness around 15 Angstrom. Magnetoresistance measurements of NixCu1-x films of different composition were obtained at both room temperature and 77 K. Anisotropic magnetoresistance of up to 1.1% and 1.7% was observed at room temperature and 77 K, respectively.
引用
收藏
页码:187 / 189
页数:3
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