The evaluation of the current-voltage and capacitance-voltage-frequency measurements of Yb/p-Si Schottky diodes with a high zero-bias barrier height

被引:8
|
作者
Lapa, Havva Elif [1 ]
Guclu, Cigdem Sukriye [2 ]
Aldemir, Durmus Ali [2 ]
Ozdemir, Ahmet Faruk [2 ]
机构
[1] Isparta Univ Appl Sci, Dept Energy Syst Engn, TR-32260 Isparta, Turkey
[2] Suleyman Demirel Univ, Dept Phys, TR-32260 Isparta, Turkey
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2020年 / 126卷 / 06期
关键词
High barrier height; Silicon; Schottky diodes; Rare Earth metals; Electrical properties; INTERFACE STATE DENSITY; ELECTRON-TRANSPORT; PARAMETERS; CONTACTS; SURFACE; MIS; SILICON; DEPENDENCE; BEHAVIOR; METALS;
D O I
10.1007/s00339-020-03662-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The rare-earth metal Yb (Ytterbium) which has a very low work function of 2.60 eV has been shown to high quality Schottky contacts to p-Si. Two distinct linear regions in the semi-logarithmic current density-voltage plot are observed for Yb/p-Si Schottky diodes. From the linear regions, the very high zero-bias barrier height values are determined as 0.83 and 0.88 eV. The value of rectification ratio is in order of similar to 10(6) which is close to the commercial Schottky diodes. From Cheung functions, the value of series resistance is found to be 12.60 Omega. Furthermore, the important contact parameters of the diodes are calculated by using modified Norde method. The contact parameters obtained from reverse bias capacitance-voltage-frequency measurements do not show an important dependence on frequency. The calculated values of acceptor concentration are in close agreement with the value of doping concentration of the p-Si wafer used in this study.
引用
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页数:9
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