Blue and green emission using In(Ga)N/GaN quantum wells with InN well layers grown by metalorganic chemical vapor deposition

被引:5
作者
Kong, Bo Hyun
Kim, Dong Chan
Cho, Hyung Koun
Lee, Kyu Han
Kim, Je Won
Kim, Bong Jin
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, Gyeonggi Do, South Korea
[2] Samsung ElectroMech Co Ltd, Photon Device Lab, Suwon 442743, South Korea
[3] NINEX, PyongTaek Si 459040, Kyonggi Do, South Korea
基金
新加坡国家研究基金会;
关键词
characterization; metalorganic chemical vapor deposition; nitrides; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2006.11.211
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In(Ga)N/GaN multiple quantum well structures with high indium composition were grown using pure InN in well layers by low-pressure metalorganic chemical vapor deposition. Blue emission using a thin In(Ga)N well width grown with only trimethylindium as a III-source showed strong carrier localization originating from a large fluctuation in indium composition and a reduced quantum-confined Stark effect due to the use of a thin well, both of which enhanced quantum efficiency. In contrast, an increase in InN growth time to achieve green emission exhibited a large blueshift of electroluminescent emission under forward-bias current and microstructural defect formation, which were responsible for the observed degradation in emission properties. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:282 / 287
页数:6
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