Systems control for a micro-stereolithography prototype

被引：6

作者：

Huang, S ^{[1
]}

Heywood, MI ^{[1
]}

Young, RCD ^{[1
]}

Farsari, M ^{[1
]}

Chatwin, CR ^{[1
]}

机构：

[1] Univ Sussex, Sch Engn, Brighton BN1 9QT, E Sussex, England

来源：

MICROPROCESSORS AND MICROSYSTEMS | 1998年 / 22卷 / 02期

基金：

英国工程与自然科学研究理事会;

关键词：

rapid prototyping; micro-stereolithography; software systems control; rapid applications development;

D O I：

10.1016/S0141-9331(98)00070-2

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The system control of a micro-stereolithographic fabrication system is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. The application of the National Instrument LabVEIW(C) environment is demonstrated to provide a good basis for rapid application development of the necessary control structures. In particular, this provides the basis for a highly flexible control system, typical activities of which include: low-level interface formats; icon-based systems design; and support for good human-computer interfacing. The resulting system has the capability to provide two orders of magnitude improvement above that currently available. (C) 1998 Elsevier Science B.V.

引用

页码：67 / 77

页数：11