Electrodeposition of ZnO thin films on n-Si(100)

被引：98

作者：

Dalchiele, EA

Giorgi, P

Marotti, RE

Martín, F

Ramos-Barrado, JR

Ayouci, R

Leinen, D

机构：

[1] Fac Ingn, Inst Fis, Montevideo 11000, Uruguay

[2] Univ Malaga, Fac Ciencias, Dept Fis Aplicada & Ingn Quim, Unidad CSIC,Lab Mat & Superficie, E-29071 Malaga, Spain

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2001年 / 70卷 / 03期

关键词：

ZnO; electrodeposition; Si; thin films;

D O I：

10.1016/S0927-0248(01)00065-4

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

In this study, ZnO thin films have been deposited onto monocrystalline n-type Si(1 0 0) by electrodeposition at different applied potentials. XRD shows a preferential orientation (0 0 0 2) that increases when the applied cathodic potential increases. The XPS analysis presents a Zn/O composition close to stoichiometric. SEM micrographs show a compact structure with localized platelets with a grain size of about 10 mum. However, crystallite size determined by the Scherrer method shows a size close to 2.50 x 10(-2) mum, then the grains can be considered as clusters of crystallites. Optical measurements were made on samples deposited on ITO/glass through the same procedures giving a band gap of 3.3 eV in agreement with the reported values for ZnO at room temperature. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

收藏

页码：245 / 254

页数：10

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