Enhanced 355-nm generation using a simple method to compensate for walk-off loss

被引：19

作者：

Jung, C. ^{[1
]}

Shin, W. ^{[1
]}

Yu, B. -A. ^{[1
]}

Lee, Y. L. ^{[1
]}

Noh, Y. -C. ^{[1
]}

机构：

[1] Gwangju Inst Sci & Technol, Adv Photon Res Inst, Kwangju 500712, South Korea

来源：

OPTICS EXPRESS | 2012年 / 20卷 / 02期

基金：

新加坡国家研究基金会;

关键词：

REPETITION-RATE; LASER; NM; OSCILLATOR;

D O I：

10.1364/OE.20.000941

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We theoretically and experimentally investigated a novel walk-off-compensation method for efficient ultraviolet beam generation. Through theoretical investigation, we described in detail how the power of a generated UV beam can be enhanced by the method; thus, we obtained a brief expression for the output power which has a prediction error of about 30%. In addition, we found that the beam quality can also be enhanced using this method. Through experiments using an alpha barium borate crystal as a walk-off compensator, we found that the power of the generated ultraviolet beam increased 1.9 times. (C)2012 Optical Society of America

引用

页码：941 / 948

页数：8

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