Self-Powered UV-Near Infrared Photodetector Based on Reduced Graphene Oxide/n-Si Vertical Heterojunction

被引:87
作者
Li, Guanghui [1 ]
Liu, Lin [2 ]
Wu, Guan [1 ]
Chen, Wei [1 ]
Qin, Sujie [2 ]
Wang, Yi [3 ,4 ]
Zhang, Ting [1 ]
机构
[1] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, I Lab, Ruoshui Rd, Suzhou 215123, Peoples R China
[2] Xian Jiaotong Liverpool Univ, Dept Environm Sci, 111 Renai Rd, Suzhou 215123, Peoples R China
[3] C&N Int Co Ltd, Beijing 102206, Peoples R China
[4] Chinese Acad Sci, Inst Biophys, Beijing 100101, Peoples R China
基金
中国国家自然科学基金;
关键词
EPITAXIAL GRAPHENE; HIGH RESPONSIVITY; BROAD-BAND; ULTRAVIOLET; PHOTOTRANSISTORS; PHOTORESPONSE; PHOTOCURRENT; PERFORMANCE; STRENGTH; SINGLE;
D O I
10.1002/smll.201600835
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A novel self-powered photodetector based on reduced graphene oxide (rGO)/n-Si p-n vertical heterojunction with high sensitivity and fast response time is presented. The photodetector contains a p-n vertical heterojunction between a drop-casted rGO thin film and n-Si. Contacts between the semiconductor layer (rGO, n-Si) and source-drain Ti/Au electrodes allow efficient transfer of photogenerated charge carriers. The self-powered UV-near infrared photodetector shows high sensitivity toward a spectrum of light from 365 to 1200 nm. Under the 600 nm illumination (0.81 mW cm(-2)), the device has a photoresponsivity of 1.52 A W-1, with fast response and recover time (2 ms and 3.7 ms), and the ON/OFF ratios exceed 10 4 when the power density reaches approximate to 2.5 mW cm(-2). The high photoresponse primarily arises from the built-in electric field formed at the interface of n-Si and rGO film. The effect of rGO thickness, rGO reduction level, and layout of rGO/n-Si effective contact area on device performance are also systematically investigated.
引用
收藏
页码:5019 / 5026
页数:8
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