Schottky barrier heights of contact metals to p-type ZnSe

被引:2
作者
Koide, Y [1 ]
Kawakami, T
Murakami, M
Teraguchi, N
Tomomura, Y
Suzuki, A
机构
[1] Kyoto Univ, Dept Mat Sci & Engn, Kyoto 60601, Japan
[2] Sharp Co Ltd, Cent Res Labs, Tenri, Nara 632, Japan
关键词
contact metal; Fermi-level pinning; p-ZnSe; Schottky barrier height (SBH);
D O I
10.1007/s11664-998-0052-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Schottky barrier heights (SBHs) of a variety of metals (fn, Cd, Nb, Ti, W, Cu, Ag, Au, Ni, Pt, and Se) contacting to p-ZnSe grown by a molecular beam epitaxy method were determined by analyzing capacitance-voltage (C-V) and/or current density-voltage (J-V) curves. The SBH values of the Au and Ni contacts were determined from intersections of straight lines of the C-2-V curves to be 1.23 and 1.13 eV, respectively. The J-V calculations provided a large SBH value of 1.2 +/- 0.1 eV fora variety of metals, indicating that the Fermi-level could be pinned at the contact interface. Reduction of the SBH values to a level lower than 0.4 eV and/or increase of doping concentrations to a level higher than 10(20) cm(-3) are essential to obtain an ohmic contact with contact resistivity of around 10(-3) Ohm.cm(2).
引用
收藏
页码:772 / 775
页数:4
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