Quantitative depth profiling of Ce3+ in Pt/CeO2 by in situ high-energy XPS in a hydrogen atmosphere

被引:86
作者
Kato, Shunsuke [1 ]
Ammann, Markus [1 ]
Huthwelker, Thomas [2 ]
Paun, Cristina [3 ]
Lampimaeki, Markus [1 ]
Lee, Ming-Tao [1 ]
Rothensteiner, Matthaeus [2 ,3 ]
van Bokhoven, Jeroen A. [2 ,3 ]
机构
[1] Paul Scherrer Inst, Lab Radio & Environm Chem, Zurich, Switzerland
[2] Paul Scherrer Inst, Lab Catalysis & Sustainable Chem, Zurich, Switzerland
[3] Swiss Fed Inst Technol, Inst Chem & Bioengn, Zurich, Switzerland
基金
瑞士国家科学基金会;
关键词
AMBIENT-PRESSURE XPS; PHOTOELECTRON-SPECTROSCOPY; SURFACE-STRUCTURES; CEO2; SURFACES; NANOPARTICLES; REDUCTION; OXIDATION; BEHAVIOR; FILMS;
D O I
10.1039/c4cp05643d
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The redox property of ceria is a key factor in the catalytic activity of ceria-based catalysts. The oxidation state of well-defined ceria nanocubes in gas environments was analysed in situ by a novel combination of near-ambient pressure X-ray Photoelectron Spectroscopy (XPS) and high-energy XPS at a synchrotron X-ray source. In situ high-energy XPS is a promising new tool to determine the electronic structure of matter under defined conditions. The aim was to quantitatively determine the degree of cerium reduction in a nano-structured ceria-supported platinum catalyst as a function of the gas environment. To obtain a non-destructive depth profile at near-ambient pressure, in situ high-energy XPS analysis was performed by varying the kinetic energy of photoelectrons from 1 to 5 keV, and, thus, the probing depth. In ceria nanocubes doped with platinum, oxygen vacancies formed only in the uppermost layers of ceria in an atmosphere of 1 mbar hydrogen and 403 K. For pristine ceria nanocubes, no change in the cerium oxidation state in various hydrogen or oxygen atmospheres was observed as a function of probing depth. In the absence of platinum, hydrogen does not dissociate and, thus, does not lead to reduction of ceria.
引用
收藏
页码:5078 / 5083
页数:6
相关论文
共 47 条
[1]  
[Anonymous], 2009, CasaXPS Manual 2.3.15: spectroscopy
[2]  
Briggs D, 2003, SURFACE ANAL
[3]   A new endstation at the Swiss Light Source for ultraviolet photoelectron spectroscopy, X-ray photoelectron spectroscopy, and X-ray absorption spectroscopy measurements of liquid solutions [J].
Brown, Matthew A. ;
Redondo, Amaia Beloqui ;
Jordan, Inga ;
Duyckaerts, Nicolas ;
Lee, Ming-Tao ;
Ammann, Markus ;
Nolting, Frithjof ;
Kleibert, Armin ;
Huthwelker, Thomas ;
Maechler, Jean-Pierre ;
Birrer, Mario ;
Honegger, Juri ;
Wetter, Reto ;
Woerner, Hans Jakob ;
van Bokhoven, Jeroen A. .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2013, 84 (07)
[4]   Looking 100 A deep into spatially inhomogeneous dilute systems with hard x-ray photoemission [J].
Dallera, C ;
Duò, L ;
Braicovich, L ;
Panaccione, G ;
Paolicelli, G ;
Cowie, B ;
Zegenhagen, J .
APPLIED PHYSICS LETTERS, 2004, 85 (19) :4532-4534
[5]   Oxidation State of Ce in CeO2-Promoted Rh/Al2O3 Catalysts during Methane Steam Reforming: H2O Activation and Alumina Stabilization [J].
Duarte, R. B. ;
Safonova, O. V. ;
Krumeich, F. ;
Makosch, M. ;
van Bokhoven, J. A. .
ACS CATALYSIS, 2013, 3 (09) :1956-1964
[6]   LUCIA, a microfocus soft XAS beamline [J].
Flank, AM ;
Cauchon, G ;
Lagarde, P ;
Bac, S ;
Janousch, M ;
Wetter, R ;
Dubuisson, JM ;
Idir, M ;
Langlois, F ;
Moreno, T ;
Vantelon, D .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 246 (01) :269-274
[7]   MIXED-VALENT GROUND-STATE OF CEO2 [J].
FUJIMORI, A .
PHYSICAL REVIEW B, 1983, 28 (04) :2281-2283
[8]   ORIGINS OF LOW-TEMPERATURE 3-WAY ACTIVITY IN PT/CEO2 [J].
GOLUNSKI, SE ;
HATCHER, HA ;
RAJARAM, RR ;
TRUEX, TJ .
APPLIED CATALYSIS B-ENVIRONMENTAL, 1995, 5 (04) :367-376
[9]   NONDESTRUCTIVE DEPTH PROFILE ANALYSIS BY CHANGING ESCAPE DEPTH OF PHOTOELECTRONS [J].
HASEGAWA, M ;
NINOMIYA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (10) :4799-4804
[10]   Study of CeO2 XPS spectra by factor analysis:: reduction of CeO2 [J].
Holgado, JP ;
Alvarez, R ;
Munuera, G .
APPLIED SURFACE SCIENCE, 2000, 161 (3-4) :301-315