Development of an Ultra-finishing technique for single-crystal diamond substrate utilizing an iron tool in H2O2 solution

被引:23
作者
Kubota, Akihisa [1 ]
Motoyama, Shuya [1 ]
Touge, Mutsumi [2 ]
机构
[1] Kumamoto Univ, Grad Sch Sci & Technol, Chuo Ku, 2-39-1 Kurokami, Kumamoto 8608555, Japan
[2] Kumamoto Univ, Magnesium Res Ctr, Chuo Ku, 2-39-1 Kurokami, Kumamoto 8608555, Japan
关键词
diamond substrate; polishing; surface smoothing; Fe tool; OH radical; POLISHING TECHNIQUE; FILMS; SILICON; CVD;
D O I
10.1016/j.diamond.2016.02.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, an ultraprecision finishing technique was developed and demonstrated to achieve an improved diamond surface. This finishing technique utilizes hydroxyl radicals (OH radicals) generated on an Fe catalyst tool in H2O2 solution. To demonstrate the feasibility of preparing an ultra-smooth diamond surface over a specific area, an Fe catalyst tool was scanned over a contact area on a diamond substrate in H2O2 solution, while the scanning speed, rotating speed, and contact load were controlled. The area on the diamond surface that had come in contact with the Fe catalyst tool was observed using scanning white light interference microscopy and atomic force microscopy. Moreover, the wear track of the Fe catalyst tool was observed from the viewpoints of chemical composition and surface morphology. The obtained results show that low concentrations of H2O2 solution play an important role in improving the surface roughness and to enhance the material removal rate. Moreover, it turned out that an atomically smooth diamond surface on a specific area can be fabricated by our proposed method. These results provide useful information for the preparation of atomically flat surfaces and microscopic structures on diamond substrates. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:177 / 183
页数:7
相关论文
共 21 条
[1]   Diamond replicas from microstructured silicon masters [J].
Björkman, H ;
Rangsten, P ;
Hollman, P ;
Hjort, K .
SENSORS AND ACTUATORS A-PHYSICAL, 1999, 73 (1-2) :24-29
[2]   Pulsed laser surface modifications of diamond thin films [J].
Cappelli, E ;
Mattei, G ;
Orlando, S ;
Pinzari, F ;
Ascarelli, P .
DIAMOND AND RELATED MATERIALS, 1999, 8 (2-5) :257-261
[3]   Diamond power devices. Concepts and limits [J].
Denisenko, A ;
Kohn, E .
DIAMOND AND RELATED MATERIALS, 2005, 14 (3-7) :491-498
[4]   UV laser polishing of thick diamond films for IR windows [J].
Gloor, S ;
Lüthy, W ;
Weber, HP ;
Pimenov, SM ;
Ralchenko, VG ;
Konov, VI ;
Khomich, AV .
APPLIED SURFACE SCIENCE, 1999, 138 :135-139
[5]   The polishing of diamond [J].
Grillo, SE ;
Field, JE .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (02) :202-209
[6]   SMOOTHING OF CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS BY ION-BEAM IRRADIATION [J].
HIRATA, A ;
TOKURA, H ;
YOSHIKAWA, M .
THIN SOLID FILMS, 1992, 212 (1-2) :43-48
[7]   Diamond polishing [J].
Hird, JR ;
Field, JE .
PROCEEDINGS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 2004, 460 (2052) :3547-3568
[8]   THE POLISHING OF DIAMOND AND DIAMOND COMPOSITE-MATERIALS [J].
HITCHINER, MP ;
WILKS, EM ;
WILKS, J .
WEAR, 1984, 94 (01) :103-120
[9]   XPS studies on damage evaluation of single-crystal diamond chips processed with ion beam etching and reactive ion beam assisted chemical etching [J].
Kawabata, Y ;
Taniguchi, J ;
Miyamoto, I .
DIAMOND AND RELATED MATERIALS, 2004, 13 (01) :93-98
[10]   Ion polishing of a diamond (100) surface artificially roughened on the nanoscale [J].
Koslowski, B ;
Strobel, S ;
Ziemann, P .
DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) :1159-1163