Electron transport in In-rich InxGa1-xN films -: art. no. 046101

被引:36
作者
Lin, SK
Wu, KT
Huang, CP
Liang, CT
Chang, YH
Chen, YF
Chang, PH [1 ]
Chen, NC
Chang, CA
Peng, HC
Shih, CF
Liu, KS
Lin, TY
机构
[1] Chang Gung Univ, Inst Electroopt Engn, Tao Yuan 333, Taiwan
[2] Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan
[3] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 333, Taiwan
[4] Natl Taiwan Ocean Univ, Inst Optoelect Sci, Chilung 202, Taiwan
关键词
D O I
10.1063/1.1847694
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have performed electrical transport measurements on metal-organic vapor phase epitaxy grown In-rich InxGa1-xN (x=1, 0.98, and 0.92) films. Within the experimental error, the electron density in InGaN films is temperature independent over a wide temperature range (4 Kless than or equal toTless than or equal to285 K). Therefore, InxGa1-xN (0.92less than or equal toxless than or equal to1) films can be regarded as degenerate semiconductor systems. The experimental results demonstrate that electron transport in In-rich InxGa1-xN (x=1, 0.98, and 0.92) films is metalliclike. This is supported by the temperature dependence of the density, resistivity, and mobility which is similar to that of a metal. We suggest that over the whole measuring temperature range residue imperfection scattering limits the electron mobility in In-rich InxGa1-xN (x=1, 0.98, and 0.92) films. (C) 2005 American Institute of Physics.
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共 17 条
[1]   Indium nitride (InN): A review on growth, characterization, and properties [J].
Bhuiyan, AG ;
Hashimoto, A ;
Yamamoto, A .
JOURNAL OF APPLIED PHYSICS, 2003, 94 (05) :2779-2808
[2]   High mobility InN films grown by metal-organic vapor phase epitaxy [J].
Chang, CA ;
Shih, CF ;
Chen, NC ;
Chang, PH ;
Liu, KS .
5TH INTERNATIONAL SYMPOSIUM ON BLUE LASER AND LIGHT EMITTING DIODES, PROCEEDINGS, 2004, :2559-2563
[3]   METALLIC P-TYPE GAAS AND GAALAS GROWN BY METALORGANIC MOLECULAR-BEAM EPITAXY [J].
KONAGAI, M ;
YAMADA, T ;
AKATSUKA, T ;
SAITO, K ;
TOKUMITSU, E ;
TAKAHASHI, K .
JOURNAL OF CRYSTAL GROWTH, 1989, 98 (1-2) :167-173
[4]   Donor and acceptor concentrations in degenerate InN [J].
Look, DC ;
Lu, H ;
Schaff, WJ ;
Jasinski, J ;
Liliental-Weber, Z .
APPLIED PHYSICS LETTERS, 2002, 80 (02) :258-260
[5]   Improvement on epitaxial grown of InN by migration enhanced epitaxy [J].
Lu, H ;
Schaff, WJ ;
Hwang, J ;
Wu, H ;
Yeo, W ;
Pharkya, A ;
Eastman, LF .
APPLIED PHYSICS LETTERS, 2000, 77 (16) :2548-2550
[6]   Surface charge accumulation of InN films grown by molecular-beam epitaxy [J].
Lu, H ;
Schaff, WJ ;
Eastman, LF ;
Stutz, CE .
APPLIED PHYSICS LETTERS, 2003, 82 (11) :1736-1738
[7]   Effect of an AlN buffer layer on the epitaxial growth of InN by molecular-beam epitaxy [J].
Lu, H ;
Schaff, WJ ;
Hwang, J ;
Wu, H ;
Koley, G ;
Eastman, LF .
APPLIED PHYSICS LETTERS, 2001, 79 (10) :1489-1491
[8]   Intrinsic electron accumulation at clean InN surfaces [J].
Mahboob, I ;
Veal, TD ;
McConville, CF ;
Lu, H ;
Schaff, WJ .
PHYSICAL REVIEW LETTERS, 2004, 92 (03) :4
[9]   The dependence of the optical energies on InGaN composition [J].
O'Donnell, KP ;
Martin, RW ;
Trager-Cowan, C ;
White, ME ;
Esona, K ;
Deatcher, C ;
Middleton, PG ;
Jacobs, K ;
Van der Stricht, W ;
Merlet, C ;
Gil, B ;
Vantomme, A ;
Mosselmans, JFW .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 82 (1-3) :194-196
[10]   Electron transport in wurtzite indium nitride [J].
O'Leary, SK ;
Foutz, BE ;
Shur, MS ;
Bhapkar, UV ;
Eastman, LF .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (02) :826-829