Low temperature crystallised Ti-rich NiTi shape memory alloy films for microactuators

被引:59
作者
Seguin, JL
Bendahan, M
Isalgue, A
Esteve-Cano, V
Carchano, H
Torra, V
机构
[1] Fac Sci & Tech St Jerome, Lab EPCM, F-13397 Marseille 20, France
[2] UPC, DFA, CIRG, E-08034 Barcelona, Spain
[3] U Jaume 1, ICD, DIOC, E-12080 Castellon, Spain
关键词
smart materials; shape memory alloys; NiTi; thin films; RF sputtering; microactuators;
D O I
10.1016/S0924-4247(98)00304-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Obtaining low temperature crystallised NiTi films would ensure a good compatibility with microelectronics processes and allow deposition on substrates that could not endure high temperatures, like polymers. We found that NiTi films containing an excess of Ti (52% at.) are crystallised when deposited on Si(100) substrates heated up to only 200 degrees C. Resistance vs. temperature measurements show typical martensitic transformation behaviour. By depositing this type of films on polyimide substrates, we obtain bimorph micro-actuators exhibiting a two-way shape memory effect. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:65 / 69
页数:5
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