Pulsed laser deposition of thin film of molybdenum

被引：6

作者：

Mostako, A. T. T. ^{[1
]}

Rao, C. V. S. ^{[2
]}

Khare, Alika ^{[1
]}

机构：

[1] Indian Inst Technol Guwahati, Dept Phys, Gauhati 781039, India

[2] Inst Plasma Res, Bhat, Gandhinagar, India

来源：

23RD NATIONAL SYMPOSIUM ON PLASMA SCIENCE AND TECHNOLOGY (PLASMA-2008) | 2010年 / 208卷

关键词：

MIRRORS;

D O I：

10.1088/1742-6596/208/1/012114

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Deposition of Molybdenum thin film via pulsed laser deposition technique under vacuum (10(-5) Tor(r)) and different pressures of Argon gas is reported on Si and SS substrate. The effect of the baking of the target chamber, back ground gas pressure and the deposition time on the crystal structures, surface morphology and the reflectivity of the thin film of Mo is presented in the paper.

引用

页数：6

共 4 条

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