The lattice distortion of β-Ga2O3 film grown on c-plane sapphire

被引:59
|
作者
Chen, Yuanpeng [1 ]
Liang, Hongwei [1 ]
Xia, Xiaochuan [1 ]
Tao, Pengcheng [1 ]
Shen, Rensheng [1 ]
Liu, Yang [1 ]
Feng, Yanbin [1 ]
Zheng, Yuehong [2 ]
Li, Xiaona [2 ]
Du, Guotong [1 ]
机构
[1] Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China
[2] Dalian Univ Technol, Sch Mat Sci & Engn, Key Lab Mat Modificat Laser Ion & Electron Beam, Minist Educ, Dalian 116024, Peoples R China
基金
中国国家自然科学基金;
关键词
CHEMICAL-VAPOR-DEPOSITION; PHASE EPITAXY; GA2O3; FILMS; THIN-FILMS; CRYSTAL; LAYERS;
D O I
10.1007/s10854-015-2821-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The beta-Ga2O3 film is grown on c-plane sapphire (Al2O3) substrate using metal organic chemical deposition method. According to high resolution X-ray diffraction measurement results, the epitaxial relationship between beta-Ga2O3 film and c-plane sapphire was confirmed. The beta-Ga2O3 film is ((2) over bar 01) preferred orientation and beta-Ga2O3 < 102 > and < 010 > directions are parallel to Al2O3 < 1 (1) over bar0 > and < 110 >, respectively. Meanwhile, the Bragg diffraction angles of beta-Ga2O3 ((2) over bar 01), ((4) over bar 01), (111) and ((1) over bar 11) planes are carefully measured. Using interplanar spacing equation and Bragg equation, the actual beta-Ga2O3 lattice constants were calculated. The results show that lattice constants b and angle b become larger, but the constant a, c becomes smaller. This suggests that it is difficult to growth high quality beta-Ga2O3 film with just one type of beta-Ga2O3 crystal grains on the Al2O3 substrate due to the mismatch of crystal structure and lattice constants.
引用
收藏
页码:3231 / 3235
页数:5
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