Effects of the compensation level on the carrier lifetime of crystalline silicon

被引:49
作者
Dubois, S. [1 ]
Enjalbert, N. [1 ]
Garandet, J. P. [1 ]
机构
[1] CEA, LITEN, INES, F-73377 Le Bourget Du Lac, France
关键词
13;
D O I
10.1063/1.2961030
中图分类号
O59 [应用物理学];
学科分类号
摘要
This study focuses on the evolution of the carrier lifetime with the compensation level in crystalline silicon. Especially we show that an increase in the compensation level reduces the recombination strength of doping species and of some metal impurities. These theoretical results are confirmed by the chemical and electrical characterizations of strongly compensated multicrystalline silicon wafers. These results are of paramount importance since an accurate control of the compensation level can lead to strong improvements in silicon solar cells efficiencies.
引用
收藏
页数:3
相关论文
共 13 条
[1]   INJECTION AND TRANSPORT OF ADDED CARRIERS IN SILICON AT LIQUID-HELIUM TEMPERATURES [J].
BROWN, JM ;
JORDAN, AG .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (01) :337-&
[2]   CHROMIUM AND CHROMIUM-BORON PAIRS IN SILICON [J].
CONZELMANN, H ;
GRAFF, K ;
WEBER, ER .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 30 (03) :169-175
[3]   MOBILITY OF ELECTRONS IN COMPENSATED SEMICONDUCTORS .I. EXPERIMENT [J].
CUEVAS, M .
PHYSICAL REVIEW, 1967, 164 (03) :1021-&
[4]   Effect of intentional bulk contamination with iron on multicrystalline silicon solar cell properties [J].
Dubois, S. ;
Palais, O. ;
Ribeyron, P. J. ;
Enjalbert, N. ;
Pasquinelli, M. ;
Martinuzzi, S. .
JOURNAL OF APPLIED PHYSICS, 2007, 102 (08)
[5]  
EINHAUS R, P 33 IEEE PHOT UNPUB
[6]  
GEERLIGS LJ, 2007, 17 NREL WORKSH UNPUB
[7]   Iron and its complexes in silicon [J].
Istratov, AA ;
Hieslmair, H ;
Weber, ER .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (01) :13-44
[8]   Validity of simplified Shockley-Read-Hall statistics for modeling carrier lifetimes in crystalline silicon [J].
Macdonald, D ;
Cuevas, A .
PHYSICAL REVIEW B, 2003, 67 (07)
[9]   Doping dependence of the carrier lifetime crossover point upon dissociation of iron-boron pairs in crystalline silicon [J].
Macdonald, D. ;
Roth, T. ;
Deenapanray, P. N. K. ;
Trupke, T. ;
Bardos, R. A. .
APPLIED PHYSICS LETTERS, 2006, 89 (14)
[10]  
MONNA R, 2005, P 20 EUR PHOT SOL EN, P1152