Study of Nanometer-Level Precise Phase-Shift System Used in Electronic Speckle Shearography and Phase-Shift Pattern Interferometry

被引:0
|
作者
Jing, Chao [1 ]
Liu, Zhongling [1 ]
Zhou, Ge [2 ]
Zhang, Yimo [2 ]
机构
[1] Sci & Technol Opt Radiat Lab, Beijing 100854, Peoples R China
[2] Tianjin Univ, Coll Precis Instrument & Opto Elect Engn, Tianjin 300072, Peoples R China
关键词
electronic speckle shearography and phase-shift pattern interferometry (ESSPSPI); the nanometer-level precise phase-shift system; flexure hinge; closed-loop control system; piezoelectric transducer;
D O I
10.1117/12.902735
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The nanometer-level precise phase-shift system is designed to realize the phase-shift interferometry in electronic speckle shearography pattern interferometry. The PZT is used as driving component of phase-shift system and translation component of flexure hinge is developed to realize micro displacement of non-friction and non-clearance. Closed-loop control system is designed for high-precision micro displacement, in which embedded digital control system is developed for completing control algorithm and capacitive sensor is used as feedback part for measuring micro displacement in real time. Dynamic model and control model of the nanometer-level precise phase-shift system is analyzed, and high-precision micro displacement is realized with digital PID control algorithm on this basis. It is proved with experiments that the location precision of the precise phase-shift system to step signal of displacement is less than 2nm and the location precision to continuous signal of displacement is less than 5nm, which is satisfied with the request of the electronic speckle shearography and phase-shift pattern interferometry. The stripe images of four-step phase-shift interferometry and the final phase distributed image correlated with distortion of objects are listed in this paper to prove the validity of nanometer-level precise phase-shift system.
引用
收藏
页数:10
相关论文
共 50 条
  • [21] Surface Deformation Measurement by Phase-Shift Holographic Interferometry
    Lu Yueguang Jiang Lingzhen Zou Lixun Hono Jing (Department of Physics)
    哈尔滨工业大学学报, 1990, (03) : 15 - 19
  • [22] EFFECT OF PIEZOELECTRIC TRANSDUCER NONLINEARITY ON PHASE-SHIFT INTERFEROMETRY
    AI, C
    WYANT, JC
    APPLIED OPTICS, 1987, 26 (06): : 1112 - 1116
  • [23] AN ELECTRONIC PHASE-SHIFT TUBE FOR MICROWAVE FREQUENCIES
    PRINGLE, DH
    JOURNAL OF SCIENTIFIC INSTRUMENTS, 1955, 32 (04): : 125 - 127
  • [24] PHASE-SHIFT OF NEUTRONS IN MAGNETIC DOMAINS OBSERVED BY INTERFEROMETRY
    NAKATANI, S
    TOMIMITSU, H
    TAKAHASHI, T
    KIKUTA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (8A): : L1137 - L1139
  • [25] Tilt-compensating algorithm for phase-shift interferometry
    Dobroiu, Adrian
    Apostol, Dan
    Nascov, Victor
    Damian, Victor
    Applied Optics, 2002, 41 (13): : 2435 - 2439
  • [26] Self-reference method for phase-shift interferometry
    Ge, ZT
    Takeda, M
    OPTICAL ENGINEERING FOR SENSING AND NANOTECHNOLOGY (ICOSN 2001), 2001, 4416 : 152 - 157
  • [27] Tilt-compensating algorithm for phase-shift interferometry
    Dobroiu, A
    Apostol, D
    Nascov, V
    Damian, V
    APPLIED OPTICS, 2002, 41 (13) : 2435 - 2439
  • [28] PHASE-SHIFT DOUBLE-EXPOSURE HOLOGRAPHIC INTERFEROMETRY
    SOMMARGREN, GE
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1975, 65 (10) : 1186 - 1186
  • [29] Research on processing technique for interference pattern with step using phase-shift interferometry
    Ge, AM
    Chen, L
    Chen, JB
    Zhu, RH
    ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGY 2000, 2000, 4231 : 371 - 374
  • [30] NEW COMPENSATING 4-PHASE ALGORITHM FOR PHASE-SHIFT INTERFEROMETRY
    SCHWIDER, J
    FALKENSTORFER, O
    SCHREIBER, H
    ZOLLER, A
    STREIBL, N
    OPTICAL ENGINEERING, 1993, 32 (08) : 1883 - 1885