Synthesis of silicon nanocones using rf microplasma at atmospheric pressure

被引:52
|
作者
Shirai, H
Kobayashi, T
Hasegawa, Y
机构
[1] Saitama Univ, Fac Engn, Dept Funct Mat Sci, Sakura, Saitama 3388570, Japan
[2] RIKEN, Wako, Saitama 3510198, Japan
[3] Saitama Univ, Grad Sch Sci & Technol, Sakura, Saitama 3388570, Japan
关键词
D O I
10.1063/1.2084342
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the synthesis of silicon nanocones using the rf microplasma discharge at atmospheric pressure. The products formed underneath the tube electrode on Fe-coated crystalline silicon were constituted mainly of silicon and silicon oxide despite the use of a methane-argon mixture. Carbon nanotubes and silicon nanowires were also formed around the silicon nanocones. The number density and average size of silicon nanocones increased with the plasma exposure time accompanied by the enlargement of their surface distribution. The growth mechanism of silicon nanocones is discussed in terms of the catalytic growth via diffusion of silicon with nanocrystalline Si particle through FeSix nanoclusters, and enhanced Si oxidation by the plasma heating. (C) 2005 American Institute of Physics.
引用
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页码:1 / 3
页数:3
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