Interaction between Sm and GaN - a photoemission study

被引:10
作者
Guziewicz, E
Kowalski, BJ
Orlowski, BA
Szczepanska, A
Golacki, Z
Kowalik, IA
Grzegory, I
Porowski, S
Johnson, RL
机构
[1] Los Alamos Natl Lab, Condensed Matter & Thermal Phys Grp, Los Alamos, NM 87545 USA
[2] Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
[3] Polish Acad Sci, High Pressure Res Ctr, PL-01141 Warsaw, Poland
[4] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
关键词
photoemission (total yield); surface diffusion; gallium nitride; metal-semiconductor interfaces;
D O I
10.1016/j.susc.2004.01.004
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report on a comprehensive study of the Sm/GaN(000 (1) under bar) interface using synchrotron radiation photoemission. Spectra were taken after stepwise Sm deposition onto a clean GaN(000 (1) under bar) surface at room temperature and after annealing. Based on the analysis of resonant photoemission spectra taken for hnu = 136 eV (divalent samarium resonance) and hnu = 141 eV (trivalent samarium resonance) we find that both divalent and trivalent samarium states are present in the GaN-Sm interface layer after each step of deposition. The average valence of the system increases from 2.57 for a coverage of 0.6 Angstrom to 2.73 for 3.2 Angstrom. Above this coverage the average valence drops and reaches a final value of 2.63 for a coverage of 10 Angstrom. The Ga3d core level evolution confirms that two valence Sm states are present in the interface region. A large chemical shift of the Ga3d core level after samarium deposition and a moderate decrease in the Ga3d attenuation curve indicate that a reactive interface is created when Sin atoms are deposited on the GaN(000 (1) under bar) surface. Annealing of the Sm/GaN system to 500 degreesC induces a valence change from Sm2+ to Sm3+ and promotes diffusion of Sm from the interface into the bulk. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:132 / 142
页数:11
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