Room-temperature below bulk-Si band gap photoluminescence from P and B co-doped and compensated Si nanocrystals with narrow size distributions

被引:19
作者
Fukuda, Masatoshi [1 ]
Fujii, Minoru [1 ]
Hayashi, Shinji [1 ]
机构
[1] Kobe Univ, Grad Sch Engn, Dept Elect & Elect Engn, Nada Ku, Kobe, Hyogo 6578501, Japan
关键词
Silicon nanocrystal; Phosphorus; Boron; Co-doping; Multi-layer; Size distribution; SILICON NANOCRYSTALS; OPTICAL-PROPERTIES; LUMINESCENCE;
D O I
10.1016/j.jlumin.2011.01.023
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Thin films consisting of the layers of phosphorus (P) and boron (B) co-doped Si nanocrystals (Si-ncs) and glass spacer layers were prepared and their photoluminescence properties were studied. Cross-sectional TEM observations revealed the growth of Si-ncs with narrow size distributions. The samples exhibited PL below the band gap energy of bulk Si crystal at room temperature. The low-energy PL is considered to arise from the transitions between donor and acceptor states in compensated Si-ncs. The successful formation of narrow size distribution co-doped Si nanocrystals promotes the study of the optical properties of compensated Si nanocrystals. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1066 / 1069
页数:4
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