Tin(II) Aminothiolate and Tin(IV) Aminothiolate Selenide Compounds as Single-Source Precursors for Tin Chalcogenide Materials
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作者:
Park, Joo-Hyun
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Park, Joo-Hyun
[1
]
Kang, Seong Gu
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Kang, Seong Gu
[1
]
Lee, Young Kuk
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
UST, Dept Chem Convergence Mat, Deajeon 34113, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Lee, Young Kuk
[1
,2
]
Chung, Taek-Mo
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
UST, Dept Chem Convergence Mat, Deajeon 34113, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Chung, Taek-Mo
[1
,2
]
Park, Bo Keun
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
UST, Dept Chem Convergence Mat, Deajeon 34113, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Park, Bo Keun
[1
,2
]
Kim, Chang Gyoun
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KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
UST, Dept Chem Convergence Mat, Deajeon 34113, South KoreaKRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Kim, Chang Gyoun
[1
,2
]
机构:
[1] KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
[2] UST, Dept Chem Convergence Mat, Deajeon 34113, South Korea
Tin aminothiolate compounds Sn-II(dmampS)(2) (1) and Sn-IV(dmampS)(2)Se (2), where dmampS = 1-(dimethylamino)-2-methylpropane-2-thiolate, were synthesized. The molecular structures of 1 and 2 reveal a seesaw and distorted trigonal-bipyramidal geometry, respectively. The H-1 NMR spectrum of 1 shows two types of resonances for the methyl groups of the alpha-carbon, methyl groups of the amino groups, and methylene groups at room temperature. On the other hand, the H-1 NMR spectrum of 2 exhibits a single resonance for each of these groups. According to variable-temperature H-1 NMR analysis, each of these two types of resonances occurring at relatively low temperatures (under 223 K for 1 and under 333 K for 2) are merged as a single resonance with increasing temperature. By using thermogravimetric and thermal decomposition analyses, the residual materials of compounds 1 and 2 are confirmed to be SnS and SnSSe, respectively. Compound 1 was subjected to a metal-organic chemical vapor deposition process, which allowed for the deposition of a dense and well-faceted orthorhombic phase SnS thin film on a SiO2/Si substrate with similar to 200 nm thickness.
机构:
Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Sungkyunkwan Univ SKKU, Dept Chem, Suwon 16419, Gyeonggi Do, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Choi, Heenang
Song, Young Eun
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Univ Sci & Technol UST, Dept Chem Convergence Mat, Daejeon 34113, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Song, Young Eun
Park, Dongseong
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Park, Dongseong
Park, Chanwoo
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Park, Chanwoo
Park, Bo Keun
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Univ Sci & Technol UST, Dept Chem Convergence Mat, Daejeon 34113, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Park, Bo Keun
Son, Seung Uk
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Sungkyunkwan Univ SKKU, Dept Chem, Suwon 16419, Gyeonggi Do, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Son, Seung Uk
Lim, Jongsun
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Lim, Jongsun
Chung, Taek-Mo
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Korea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
Univ Sci & Technol UST, Dept Chem Convergence Mat, Daejeon 34113, South KoreaKorea Res Inst Chem Technol KRICT, Thin Film Mat Res Ctr, Daejeon 34114, South Korea
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Kim, Hyo-Suk
Jung, Eun Ae
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Jung, Eun Ae
Han, Seong Ho
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Han, Seong Ho
Han, Jeong Hwan
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Han, Jeong Hwan
Park, Bo Keun
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Park, Bo Keun
Kim, Chang Gyoun
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea
Kim, Chang Gyoun
Chung, Taek-Mo
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Korea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South KoreaKorea Res Inst Chem Technol, Thin Film Mat Res Ctr, 141 Gajeong Ro, Daejeon 34114, South Korea