Synthesis and characterization of nanocrystalline diamond films deposited by microwave plasma chemical vapour deposition

被引：1

作者：

Zhou, Wen-Long ^{[1
]}

Zhang, Ming ^{[1
]}

Song, Xue-Mei ^{[1
]}

Yan, Hui ^{[1
]}

机构：

[1] Beijing Univ Technol, Dept Mat Sci & Engn, Beijing 100124, Peoples R China

来源：

CHEMICAL, MECHANICAL AND MATERIALS ENGINEERING | 2011年 / 79卷

关键词：

nanocrystalline diamond; Hardness; surface roughness; CARBON-FILMS; CVD; MODULUS;

D O I：

10.4028/www.scientific.net/AMM.79.187

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Nanocrystalline diamond films have been synthesized by microwave plasma enhanced chemical vapour deposition using H-2/CH4 as the reactant gas. Nanocrystalline diamond thin films with surface roughness of 11.8 nm were obtained on silicon substrates. The nanocrystallinity, surface roughness and hardness were characterized by the Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy and Nano Indentation, respectively. The Raman spectra of the films exhibit a band near 1145 cm(-1) and XRD patterns indicate the presence of nanocrystalline diamond. The hardness value of individual test point is approximately 102 GPa and the average hardness of thin film could reach 86 GPa.

引用

页码：187 / 191

页数：5

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