Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge

被引：11
作者：
de Poucques, L
Imbert, JC
Vasina, P
Boisse-Laporte, C
Teulé-Gay, L
Bretagne, J
Touzeau, M
机构：
[1] Univ Paris 11, Phys Gaz & Plasmas Lab, F-91405 Orsay, France
[2] Dept Phys Elect, Brno 61137, Czech Republic
来源：
SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 1-4期
关键词：
IPVD; sputtering; microwave discharge; RF discharge; absorption spectroscopy;
D O I：
10.1016/j.surfcoat.2005.03.046
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
While most of lonised Physical Vapour Deposition (IPVD) reactors use radio-frequency coils to create additional ionisation, we developed an alternative technique using two microwave antennas to achieve the ionisation of the sputtered vapour. The aim of this paper is to compare the ionisation efficiency of these two devices in the same reactor chamber. (c) 2005 Published by Elsevier B.V.
引用
收藏
页码：800 / 803
页数：4
相关论文
共 5 条
[1]   New type of plasma reactor for thin film deposition:: magnetron plasma process assisted by microwaves to ionise sputtered vapour [J].
Boisse-Laporte, C ;
Leroy, O ;
de Poucques, L ;
Agius, B ;
Bretagne, J ;
Hugon, MC ;
Teulé-Gay, L ;
Touzeau, M .
SURFACE & COATINGS TECHNOLOGY, 2004, 179 (2-3) :176-181
[2]   Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy [J].
Konstantinidis, S ;
Ricard, A ;
Ganciu, M ;
Dauchot, JP ;
Ranea, C ;
Hecq, M .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (05) :2900-2905
[3]   Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems [J].
Leroy, O ;
de Poucques, L ;
Boisse-Laporte, C ;
Ganciu, M ;
Teulé-Gay, L ;
Touzeau, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (01) :192-200
[4]  
Rossnagel S.M., 1990, FUNDAMENTALS ETCHING
[5]  
VASINA P, 2003, P 16 ISPC TAORM IT, P1
1