Room-temperature photopatternable low-dielectric cured resins derived from siloxane-carbosilane hybridized polymers

被引：11

作者：

Fan, Li ^{[1
,2
]}

Zhang, Shengbo ^{[1
]}

Li, Xian ^{[1
]}

Hu, Huan ^{[1
]}

Huang, Yawen ^{[1
]}

Ma, Jiajun ^{[1
]}

Yang, Junxiao ^{[1
]}

机构：

[1] Southwest Univ Sci & Technol, Sch Mat Sci & Engn, State Key Lab Environm Friendly Energy Mat, Mianyang 621010, Peoples R China

[2] Southwest Univ Sci & Technol, Sch Natl Def Sci & Technol, Mianyang 621010, Peoples R China

来源：

JOURNAL OF MATERIALS CHEMISTRY C | 2019年 / 7卷 / 06期

关键词：

THERMAL-ISOMERIZATION; O-QUINODIMETHANES; IN-SITU; LOW-K; CONSTANT; POLYCARBOSILANE; BENZOCYCLOBUTENE; POLYMERIZATION; CHEMISTRY; FILMS;

D O I：

10.1039/c8tc04807j

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Polycarbosilane-based thermosets exhibit promising low-dielectric properties but relatively low thermal resistance. In this work, to overcome this drawback, siloxane units were incorporated into the main chain of polycarbosilane via hydrolytic condensation to generate oligomers with siloxane-carbosilane hybridized main chains (oligomeric PCOSs). These oligomers enabled subsequent ultraviolet curing via the reaction of disilacyclobutene and thermal curing via the reaction of benzocyclobutene on the pendant groups to form cured resins. The cured resins were photopatternable, and not only showed enhanced thermal resistance compared with that of polycarbosilane-based thermosets, but also maintained outstanding low-dielectric properties.

引用

页码：1518 / 1524

页数：7

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