共 17 条
Effect of arsenic species on the kinetics of GaAs nanowires growth by molecular beam epitaxy
被引:27
作者:

Sartel, C.
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机构:
CNRS LPN, F-91460 Marcoussis, France CNRS LPN, F-91460 Marcoussis, France

Dheeraj, D. L.
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h-index: 0
机构:
Norwegian Univ Sci & Technol, Dept Elect & Telecommun, NO-7491 Trondheim, Norway CNRS LPN, F-91460 Marcoussis, France

Jabeen, F.
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CNRS LPN, F-91460 Marcoussis, France CNRS LPN, F-91460 Marcoussis, France

Harmand, J. C.
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CNRS LPN, F-91460 Marcoussis, France CNRS LPN, F-91460 Marcoussis, France
机构:
[1] CNRS LPN, F-91460 Marcoussis, France
[2] Norwegian Univ Sci & Technol, Dept Elect & Telecommun, NO-7491 Trondheim, Norway
关键词:
Molecular beam epitaxy;
Gallium compounds;
Nanomaterials;
SURFACES;
ALGAAS;
D O I:
10.1016/j.jcrysgro.2010.04.027
中图分类号:
O7 [晶体学];
学科分类号:
0702 ;
070205 ;
0703 ;
080501 ;
摘要:
GaAs nanowires (NWs) are grown on GaAs (1 1 1) B substrates in a molecular beam epitaxy system, by Au-assisted vapor-liquid-solid growth. We compare the characteristics of NWs elaborated with As-2 or As-4 molecules. In a wide range of growth temperatures, As-4 leads to growth rates twice faster than As-2. The shape of the NWs also depends on the arsenic species: with As-4, regular rods can be obtained, while pencil-like shape results from growth with As-2. From the analysis of the incoming fluxes, which contributes to the NWs formation, we conclude that the diffusion length of Ga adatoms along the NW sidewalls is smaller under As-2 flux as compared to that under As-4 flux. It follows that As-2 flux is favourable to the formation of radial heterostructures, whereas As-4 flux is preferable to maintain pure axial growth. (C) 2010 Elsevier B.V. All rights reserved.
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页码:2073 / 2077
页数:5
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