Ion flux and deposition rate measurements in the RF continuous wave plasma polymerisation of acrylic acid

被引：18

作者：

Beck, AJ

France, RM

Leeson, AM

Short, RD ^{[1
]}

Goodyear, A

Braithwaite, NS

机构：

[1] Univ Sheffield, Dept Mat Engn, Lab Phys & Interface Anal, Sheffield S1 3JD, S Yorkshire, England

[2] Open Univ, Oxford Res Unit, Oxford OX1 5HR, England

来源：

CHEMICAL COMMUNICATIONS | 1998年 / 11期

关键词：

D O I：

10.1039/a801778f

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Ion flux and deposition rate measurements made in plasmas of acrylic acid support the view that at low plasma power ions are primarily responsible for deposit growth.

引用

页码：1221 / 1222

页数：2

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