Modelization and characterization of Au/InSb/InP Schottky systems as a function of temperature

被引:81
作者
Akkal, B
Benamara, Z [1 ]
Boudissa, A
Bouiadjra, NB
Amrani, M
Bideux, L
Gruzza, B
机构
[1] Univ Djillali Liabes, Lab Microelect Appl, Sidi Bel Abbes 22000, Algeria
[2] Univ Clermont Ferrand 2, Lab Sci Mat Elect & Automat, F-63177 Aubiere, France
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1998年 / 55卷 / 03期
关键词
Au/InP(n) Schottky diode;
D O I
10.1016/S0921-5107(98)00168-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work attempts to characterize the Au/InP Schottky diode at different temperatures (in the range 300-425 K). The InP surface is restructured with an InSb thin film with several monolayers. I(V) analysis versus different temperatures gives the saturation current variation I-s(2 x 10(-5)-7 x 10(-5) A), the mean ideality factor (1.7-1.24), the barrier height (0.47-0.45 V), and finally the serial resistance R-s variations (85-19 Omega). The doping concentration N-d and the diffusion voltage V are calculated using the C(V) characteristics. The concentration N-d is 3 x 10(15) cm(-3) at room temperature and increases with thermal activation to 7 x 10(15) cm(-3) at 425 K. Nevertheless, the diffusion voltage V-d is reversibly proportional to the doping concentration N-d and decreases from 33.7 x 10(-2) to 29 x 10(-2) V. The mean interfacial state density N-ss decreases with increasing temperature, from 4.33 x 10(12) to 10(12) cm(-2).eV(-1). This improvement is the result of molecular restructuring and reordering at the Au/InP interface. For temperatures less than 375 K, the C(V) characteristic is controlled by an important interfacial state density and/or the presence of deep donor levels in the semiconductor bulk. At temperatures greater than 375 K, the C-2(V) curve is linear and the deep donor levels disappear; The traps effect is also reduced. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:162 / 168
页数:7
相关论文
共 17 条
[2]   STRUCTURAL AND ELECTRICAL STUDY OF [AU/INP(100)] AND [AU/INSB/INP(100)] SYSTEMS [J].
BIDEUX, L ;
GRUZZA, B ;
PORTE, A ;
ROBERT, H .
SURFACE AND INTERFACE ANALYSIS, 1993, 20 (09) :803-807
[3]   Study of Al2O3 condensation on Si(100) and InP(100) substrates [J].
Bideux, L ;
Robert, C ;
Gruzza, B ;
Matolin, V ;
Benamara, Z .
SURFACE SCIENCE, 1996, 352 :407-410
[4]  
BRILLSON LJ, 1978, J VAC SCI TECHNOL, V15, P1378, DOI 10.1116/1.569792
[5]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[6]   NORMALIZED THERMIONIC-FIELD (T-F) EMISSION IN METAL-SEMICONDUCTOR (SCHOTTKY) BARRIERS [J].
CROWELL, CR ;
RIDEOUT, VL .
SOLID-STATE ELECTRONICS, 1969, 12 (02) :89-&
[7]   ELECTRON TRAPPING IN THIN OXIDE ON N-INP [J].
EFTEKHARI, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (04) :1317-1318
[9]  
HEINE V, 1965, PHYS REV, V138, P1639
[10]   ABRUPT INTERFACES ON INP(110) - CASES OF SB AND SN [J].
KENDELEWICZ, T ;
MIYANO, K ;
CAO, R ;
LINDAU, I ;
SPICER, WE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04) :991-996