Implication of subband broadening in the quantum well of a-Si:H/a-Ge:H multilayers

被引:4
作者
Ohmura, M [1 ]
Deki, H [1 ]
Yamashita, K [1 ]
Miyazaki, S [1 ]
Hirose, M [1 ]
机构
[1] HIROSHIMA UNIV, DEPT ELECT ENGN, HIGASHIHIROSHIMA 739, JAPAN
关键词
D O I
10.1016/0022-3093(96)00045-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The optical absorption, photoluminescence and conductivity of well-defined a-Si:H/a-Ge:H multilayers have been investigated as a function of the a-Si:H barrier width. The optical absorption edge and luminescence peak energy exhibit a similar red-shift with decreasing the a-Si:H barrier width. Also, the decrease of the barrier width causes a reduction in the conductivity activation energy and the corresponding increase in the dark conductivity. These properties are explained partly by the subband broadening in the a-Ge:H quantum well because of the enhanced carrier tunneling probability through the ultrathin a-Si:H barriers and partly by a decrease of hydrogen content in the a-Ge:H well layer.
引用
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页码:817 / 820
页数:4
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