I-line sensitive photoacid generators and their use for photocrosslinking of polysilane/diepoxyfluorene blend

被引：29

作者：

Okamura, H

Sakai, K

Tsunooka, M

Shirai, M

Fujiki, T

Kawasaki, S

Yamada, M

机构：

[1] Univ Osaka Prefecture, Dept Appl Chem, Grad Sch Engn, Sakai, Osaka 5998531, Japan

[2] Osaka Gas Co Ltd, Dept Res & Dev, Osaka 5440051, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2003年 / 16卷 / 01期

关键词：

photocrosslinking; fluorene; epoxide; polysilane; photoacid generator; 366 nm light;

D O I：

10.2494/photopolymer.16.87

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：87 / 90

页数：4

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