Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

被引：38

作者：

Bae, SH

Lee, SY

Kim, HY

Im, S

机构：

[1] Yonsei Univ, Dept Elect & Comp Engn, Seodaemun Ku, Seoul 120749, South Korea

[2] Yonsei Univ, Inst Phys & Appl Phys, Seodaemun Ku, Seoul 120749, South Korea

[3] Yonsei Univ, Dept Phys, Seodaemun Ku, Seoul 120749, South Korea

来源：

APPLIED SURFACE SCIENCE | 2000年 / 168卷 / 1-4期

关键词：

ZnO; PLD; UV; XRD; PL; stoichiometry;

D O I：

10.1016/S0169-4332(00)00781-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (I 0 0) p-type silicon substrates and (0 0 I) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 degreesC at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL). (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：332 / 334

页数：3

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