Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition

被引：38
|
作者：
Bae, SH
Lee, SY
Kim, HY
Im, S
机构：
[1] Yonsei Univ, Dept Elect & Comp Engn, Seodaemun Ku, Seoul 120749, South Korea
[2] Yonsei Univ, Inst Phys & Appl Phys, Seodaemun Ku, Seoul 120749, South Korea
[3] Yonsei Univ, Dept Phys, Seodaemun Ku, Seoul 120749, South Korea
来源：
APPLIED SURFACE SCIENCE | 2000年 / 168卷 / 1-4期
关键词：
ZnO; PLD; UV; XRD; PL; stoichiometry;
D O I：
10.1016/S0169-4332(00)00781-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (I 0 0) p-type silicon substrates and (0 0 I) sapphire substrates by pulsed laser deposition (PLD) technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen was used as ambient gas. Substrate temperatures were varied in the range of 200-600 degreesC at a fixed oxygen gas pressure of 350 mTorr. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL). (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：332 / 334
页数：3
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