Improved cost-effectiveness of the block co-polymer anneal process for DSA

被引：4

作者：

Pathangi, Hari ^{[1
]}

Stokhof, Maarten ^{[2
]}

Knaepen, Werner ^{[2
]}

Vaid, Varun ^{[1
]}

Mallik, Arindam ^{[1
]}

Chan, Boon Teik ^{[1
]}

Vandenbroeck, Nadia ^{[1
]}

Maes, Jan Willem ^{[2
]}

Gronheid, Roel ^{[1
]}

机构：

[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

[2] ASM Int, Kapeldreef 75, B-3001 Leuven, Belgium

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII | 2016年 / 9777卷

关键词：

Directed self-assembly; chemo epitaxy; defect reduction; cost of ownership; batch anneal;

D O I：

10.1117/12.2220043

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This manuscript first presents a cost model to compare the cost of ownership of DSA and SAQP for a typical front end of line (FEoL) line patterning exercise. Then, we proceed to a feasibility study of using a vertical furnace to batch anneal the block co-polymer for DSA applications. We show that the defect performance of such a batch anneal process is comparable to the process of record anneal methods. This helps in increasing the cost benefit for DSA compared to the conventional multiple patterning approaches.

引用

页数：5

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