A general solution to the Schrodinger-Poisson equation for a charged hard wall: Application to potential profile of an AlN/GaN barrier structure

被引:7
作者
Berland, Kristian [1 ]
机构
[1] Chalmers, MC2, Dept Microtechnol & Nanosci, SE-41296 Gothenburg, Sweden
关键词
Schrodinger-Poisson equation; Two-dimensional electron gas; Interfaces; Surface states; AlN/GaN heterostructures; Band bending; ELECTRIC QUANTUM LIMIT; SURFACE; SEMICONDUCTOR; FIELD;
D O I
10.1016/j.spmi.2011.08.003
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A general, system-independent, formulation of the parabolic Schrodinger-Poisson equation is presented for a charged hard wall in the limit of complete screening by the ground state. It is solved numerically using iteration and asymptotic boundary conditions. The solution gives a simple relation between the band bending and sheet charge density at an interface. Approximative analytical expressions for the potential profile and wave function are developed based on properties of the exact solution. Specific tests of the validity of the assumptions leading to the general solution are made. The assumption of complete screening by the ground state is found be a limitation; however, the general solution provides a fair approximate account of the potential profile when the bulk is doped. The general solution is further used in a simple model for the potential profile of an AlN/GaN barrier structure. The result compares well with the solution of the full Schrodinger-Poisson equation. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:411 / 418
页数:8
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