Inversion symmetric vs. asymmetric excitations and the low-temperature universal properties of Ar:N2 and Ar:N2: CO glasses

被引:2
|
作者
Gaita-Arino, A. [1 ]
Gonzalez-Albuixech, V. F. [1 ]
Schechter, M. [2 ]
机构
[1] Univ Valencia, Inst Ciencia Mol, Paterna 46980, Spain
[2] Ben Gurion Univ Negev, Dept Phys, IL-84105 Beer Sheva, Israel
基金
以色列科学基金会;
关键词
THERMAL-CONDUCTIVITY; TUNNELING STATES; AMORPHOUS SOLIDS; LENNARD-JONES; MODEL GLASS; (KBR)1-X(KCN)X; ATTENUATION; POTENTIALS; CRYSTALS; ALLOYS;
D O I
10.1209/0295-5075/109/56001
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The bias energies of various two- level systems ( TLSs) and their strengths of interactions with the strain are calculated for Ar:N-2 glass. Unlike the case in KBr: CN, a distinct class of TLSs having weak interaction with the strain and untypically small bias energies is not found. The addition of CO molecules introduces CO flips which form such a class of weakly interacting TLSs, albeit at much lower coupling than that at which they are typically observed in solids. We conclude that because of the absence of a distinct class of weakly interacting TLSs, Ar:N-2 is a non- universal glass, the first such system in three dimensions and in ambient pressure. Our results further suggest that Ar:N-2:CO may show universal properties, but at temperatures lower than approximate to 0.1K, much smaller than the typical temperature approximate to 3K associated with universality, because of the untypical softness of this system. Our results thus shed light on two long- standing questions regarding the low- temperature properties of glasses: the necessary and sufficient conditions for quantitative universality of phonon attenuation, and what dictates the energy scale of approximate to 3 K below which universality is typically observed. Copyright (C) EPLA, 2015
引用
收藏
页数:6
相关论文
共 50 条
  • [41] Comparison of the Active Species in the RF and Microwave Flowing Discharges of N2 and Ar–20 %N2
    André Ricard
    Jean-Philippe Sarrette
    Soo-Ghee Oh
    Yu Kwon Kim
    Plasma Chemistry and Plasma Processing, 2016, 36 : 1559 - 1570
  • [42] Thermoactivation spectroscopy of solid Ar doped with N2
    Ponomaryov, A. N.
    Savchenko, E. V.
    Khizhniy, I. V.
    Gumenchuk, G. B.
    Frankowski, M.
    Bondybey, V. E.
    LOW TEMPERATURE PHYSICS, 2007, 33 (6-7) : 532 - 537
  • [43] Triple Point Behavior of Ar and N2 in Mesopores
    T. Hofmann
    D. Wallacher
    P. Huber
    K. Knorr
    Journal of Low Temperature Physics, 2005, 140 : 91 - 103
  • [44] Adsorption of Ar and N2 on dealuminated mordenite tuffs
    Ortega, Karla
    Angel Hernandez, Miguel
    Portillo, Roberto
    Ayala, Edgar
    Romero, Omar
    Rojas, Fernando
    Rubio, Efrain
    Pestryakov, Alexey
    Petranovskii, Vitalii
    16TH INTERNATIONAL SCIENTIFIC CONFERENCE CHEMISTRY AND CHEMICAL ENGINEERING IN XXI CENTURY DEDICATED TO PROFESSOR L.P. KULYOV (CCE 2015), 2015, 15 : 65 - 71
  • [45] Adsorptive separation of N2 and Ar by different zeolites
    Guan, LL
    Jiang, H
    Duan, LY
    Xie, YC
    ACTA CHIMICA SINICA, 2002, 60 (07) : 1235 - 1241
  • [46] ANGULAR DISTRIBUTION OF SCATTERING OF AR BY N2 AND NE
    ANLAUF, KG
    BICKES, RW
    BERNSTEIN, RB
    JOURNAL OF CHEMICAL PHYSICS, 1971, 54 (08): : 3647 - +
  • [47] Modeling of inductively coupled plasma Ar/Cl2/N2 plasma discharge: Effect of N2 on the plasma properties
    Chanson, Romain
    Rhallabi, Ahmed
    Fernandez, Marie Claude
    Cardinaud, Christophe
    Landesman, Jean Pierre
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (01):
  • [48] Triple point behavior of Ar and N2 in mesopores
    Hofmann, T
    Wallacher, D
    Huber, P
    Knorr, K
    JOURNAL OF LOW TEMPERATURE PHYSICS, 2005, 140 (1-2) : 91 - 103
  • [49] THERMAL-DECOMPOSITION OF N2O IN AR, HE, N2, OR CO ATMOSPHERES
    ZASLONKO, IS
    LOSEV, AS
    MOZZHUKHIN, EV
    MUKOSEEV, YK
    KINETICS AND CATALYSIS, 1980, 21 (02) : 236 - 240
  • [50] Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures
    Muta, H
    Koga, M
    Itagaki, N
    Kawai, Y
    SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3): : 157 - 161